“Zhongwei Company has released six independently developed devices, accelerating its platform-based layout.”
2026-09-05 08:00Products & Apps🔥 42.2 heat score
1sources
1days unfolding
42.2heat score
4mentions
SummaryAI generated
During the 14th Semiconductor Equipment, Materials, and Core Components Exhibition (CSEAC 2026), Zhongwei Company introduced six newly developed micro-processing devices, covering processes such as ultra-high aspect ratio etching, PECVD, ALD, metal film deposition, and silicon carbide epitaxy. Among them, the PrimoXD-RIE™ etcher can achieve ultra-high aspect ratio etching with a ratio of 70:1 to 90:1; PerformoQuaStar®ON, as the first product in the PECVD series, can process up to 16 wafers simultaneously on a single system. Since its establishment in 2004, Zhongwei Company has developed 54 high-end semiconductor devices. Over 8,800 reaction stations have been mass-produced on more than 220 production lines at home and abroad. Currently, more than 50 device products cover over 30% of pre-processing integrated circuit equipment products.
During the 14th Semiconductor Equipment, Materials, and Core Components Exhibition (CSEAC 2026), SMIC introduced six newly developed micro-processing equipment, covering processes such as ultra-high depth-width ratio etching, PECVD, ALD, metal film deposition, and silicon carbide epitaxy. Among them, the PrimoXD-RIE™ etcher can achieve ultra-high depth-width ratio etching with a ratio of 70:1 to 90:1; PerformoQuaStar®ON, as the first product in the PECVD series, can process up to 16 wafers simultaneously on a single system. Since its establishment in 2004, SMIC has developed 54 high-end semiconductor equipment. Over 8,800 reaction units have been mass-produced on more than 220 production lines domestically and internationally. Currently, more than 50 equipment products cover over 30% of pre-process integrated circuit equipment products.