ASML locks in TSMC, Samsung, and Intel while Huawei races to break its grip
ASML 已说服三星、台积电和英特尔转向更大光罩,预计将提升其最新 EUV 机台 40% 的产能。与此同时,华为正策划中国反制战略,试图通过设备制造商尤利安盛及其自有供应商摆脱对荷兰光刻技术的依赖。该文章最初发表于 The Decoder。
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ASML has persuaded TSMC, Samsung, and Intel to switch to using larger-sized reticles, which is expected to increase the production capacity of their latest EUV lithography machines by 40%. Meanwhile, Huawei is planning a countermeasure strategy, attempting to get rid of its dependence on Dutch lithography technology through equipment manufacturer Ulijn Sem and its own supply chain.
ASML 已说服三星、台积电和英特尔转向更大光罩,预计将提升其最新 EUV 机台 40% 的产能。与此同时,华为正策划中国反制战略,试图通过设备制造商尤利安盛及其自有供应商摆脱对荷兰光刻技术的依赖。该文章最初发表于 The Decoder。